(Image credit: James Abbott) (opens in new tab) Quality of resultsĪbove is a before and after comparison of Exposure X7's Bleach Bypass preset. You can create any number of virtual copies of an image to try out different looks, and you can even ‘audition’ up to six presets at a time to see and select the one you prefer. This is also where you’ll find Exposure X7’s analog effects tools and overlays, including bokeh blur, vignettes, light leaks, LUTs and more.Īll of Exposure X7’s adjustments and effects are non-destructive when you’re using it in standalone mode. The controls available are easy to use and provide the level of control required for editing raw files, carrying out out everyday enhancements like tone and color adjustments, retouching and sharpening. In terms of the main adjustments, these are tucked away neatly in panels on the righthand side of the interface and can be expanded to show their controls or left minimised to keep the interface looking neat, tidy and less intimidating for beginners. There is a large catalog of preset image effects in the left sidebar, and while you may not use them all, you can 'favorite' the ones you like most.
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In this latest version of Exposure, there are several new features including a masking tool that makes it incredibly easy to select elements within images thanks to an intelligent algorithm the crop and transform panels have been combined along with the addition of compositional guides within the crop tool overlay different workspaces are available for performing various tasks as well as the ability to create custom workspaces and save your own presets then there’s improved colour with DNG files and defective pixel removal for raw files. Speaking of presets, the hundreds of presets included provide a huge range of effects that can be applied at the click of a button. The graduated filters are fiddly to use and would perhaps be better as dedicated tools rather than masks, but you do get used to how they work – and, being masks, they can be used on adjustment layers for blending in any of Exposure X7’s adjustments or preset effects. (Image credit: James Abbott) (opens in new tab)īeyond standard raw processing controls and global adjustments, there are localised adjustments that are applied as masks that can be targeted to parts of the image based on colour, luminance and saturation.
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You can also create your own presets that help you define your own signature look allowing you to recall and apply it at will.Editing tools are displayed in a series of expandable panels in the right sidebar, and combine regular adjustments with analog film effect 'overlays', plus cropping, perspective correction and retouching. Use it to correct a colorcast, soften a digital portrait, or tweak contrast with the powerful slider and curve controls. There are over 300 effects presets in Exposure 2, including push and cross processing, a vastly improved infrared simulator, and sophisticated colour to black and white conversion.Įxposure 2 simplifies your workflow by providing control over colour, dynamic range, softness, and grain control into one easy-to-use plug-in.
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Exposure 2’s grain size automatically adjusts to your image size, providing you with consistent and accurate results across all of your cameras. The capability to emulate the distinctive look of film grain is awesome and has been improved over the capabilities in Exposure 1, Version 2 gives you the most realistic grain on the market, providing you with control over sharpness, colour variation, and intensity throughout the images entire tonal range. With this excellent tool you can match the look of popular film stocks like Portra®, Velvia®, Kodachrome®, Polaroid®, TRI-X®, Agfa® Scala®, GAF® 500, and Kodak® EES. The variety of films you can simulate with Exposure 2 is truly impressive.
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With Exposure 2 you have one-click access to the broadest range of film stocks and special effects settings available in any software package. Exposure 2 has been updated to include even more capabilities to give digital photographs the look and feel of film.